Sub-70 nm extreme ultraviolet lithography at the Advanced Light Source static microfield exposure station using the engineering test stand set-2 optic
| Publication | Article in Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, published November 2002 |
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| Authors | Patrick Naulleau, Kenneth A. Goldberg, Erik H. Anderson, David Attwood, Phillip Batson, Jeffrey...[ show more ] |
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