Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic
Publication | Article in Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, published September 2005 |
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Authors | Patrick P. Naulleau, Jason P. Cain, Kenneth A. Goldberg |
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