Influence of hydrogen plasma surface treatment of Si substrate on nickel silicide formation
| Publication | Article in Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, published May 2006 |
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| Authors | Aniruddha Vengurlekar, Satheesh Balasubramanian, S. Ashok, David Theodore, Dongzhi Chi |
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