Stochastic simulation of the UV curing process in nanoimprint lithography: Pattern size and shape effects in sub-50 nm lithography
| Publication | Article in Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, published November 2017 |
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| Authors | Masanori Koyama, Masamitsu Shirai, Hiroaki Kawata, Yoshihiko Hirai, Masaaki Yasuda |
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