100 kV thermal field emission electron beam lithography tool for high-resolution x-ray mask patterning
| Publication | Article in Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena, published November 1992 |
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| Authors | M. A. McCord, R. Viswanathan, F. J. Hohn, A. D. Wilson, R. Naumann, T. H. Newman |
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