Difference in Diffusion Length of Ga Atoms under As2 and As4 Flux in Molecular Beam Epitaxy
| Publication | Article in Japanese Journal of Applied Physics, published September 1997 |
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| Authors | Takeyoshi Sugaya, Tadashi Nakagawa, Yoshinobu Sugiyama, Yasuhiko Tanuma, Kenji Yonei |
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