Paramagnetic Point Defects in Amorphous Silicon Dioxide and Amorphous Silicon Nitride Thin Films: II . a‐SiNx:H
| Publication | Article in Journal of The Electrochemical Society, published March 1992 |
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| Authors | W. L. Warren, J. Kanicki, F. C. Rong, E. H. Poindexter |
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