(Invited) Degradation in HfSiON Film Induced by Electrical Stress Application
| Publication | Article in ECS Transactions, published April 2010 |
|---|---|
| Authors | Ryu Hasunuma, Chihiro Tamura, Tsuyoshi Nomura, Yuuki Kikuchi, Kenji Ohmori, Motoyuki Sato, Akira...[ show more ] |
This is the public page for a publication record in Dimensions, a free research insights platform that brings together information about funding, scholarly outputs, policy, patents and grants.
Loading metrics…