Remote Plasma-Enhanced Chemical Vapor Deposition of Epitaxial Silicon On Silicon (100) at 150°C
| Publication | Article in MRS Advances, published December 1989 |
|---|---|
| Authors | T. Hsu, B. Anthony, L. Breaux, S. Banerjee, A. Tasch |
This is the public page for a publication record in Dimensions, a free research insights platform that brings together information about funding, scholarly outputs, policy, patents and grants.
Loading metrics…